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SEM images of a) an individual line and b) arrayed lines with SiO 2 nanoparticle layers, c) elemental mapping of Si of the arrayed lines, d) a cross‐sectional TEM image of an individual line and e) a magnified view of the red‐marked region.

Journal: Small (Weinheim an Der Bergstrasse, Germany)

Article Title: Two‐Photon Microbubble Printing: Asymmetric Assembly for Continuous Laser Writing

doi: 10.1002/smll.202505445

Figure Lengend Snippet: SEM images of a) an individual line and b) arrayed lines with SiO 2 nanoparticle layers, c) elemental mapping of Si of the arrayed lines, d) a cross‐sectional TEM image of an individual line and e) a magnified view of the red‐marked region.

Article Snippet: For cross‐sectional TEM (JEM‐2100, JEOL Co., Japan) and SEM observations, thin sections with a thickness of 200 nm were prepared from the laser‐written lines using focused ion beam (FIB) etching (JEM‐9320, JEOL Co., Japan).

Techniques: